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TiC/TiN/TiCN/a-Al2O3/k-Al2O3 coatings chemical vapor deposition CVD furnace
1. Main technical parameters
3.1. Small floor space and reasonable layout.
3.2. High degree of automation.
3.3.Supporting auxiliary equipment such as tail gas neutralization device, titanium tetrachloride filling device, gas busbar, etc., can be provided.
3.4. Process control system is conducive to independent R&D of new processes.
4.CVD graphit boat
Various types of graphite boats can be provided.
5.CVD reaction chamber
The CVD reaction chambers are centrifugally cast with high -temperature alloy,which can greatly reduce deformation adn increase the life time to 200 furnaces.